Semiconductor

Multi-Axis Stage Characterization & Position Control

for EUV mask inspection & lithography

EUV lithography has become the key technology for advanced microchip manufacturing. By using a shorter wavelength the transistor density can be increased, enabling higher computing power in ever smaller devices.

To further enhance process stability leading manufacturers deploy EUV technology not only in the lithography process itself, but also use actinic photomask inspection to frequently monitor pattern imperfections or changes in reflection properties throughout the reticle´s lifetime. Such inspection at EUV wavelength requires vacuum conditions and - to achieve nanometer precision - a vacuum compatible, yet fast and ultra-precise sensor for stage characterization or even closed-loop motion control.