Laser Beam Filter Positioning
for optical metrology processes
In optical metrology processes, the precise alignment and filtering of the beam is directly related to the wafer´s quality. The laser source emits high energy photons that are collected via a gathering mirror. The created beam is then directed and shaped via further mirrors and different filters to precisely hit, e.g. the reflection mask.
attocube nanopositioners are designed to operate with low particle generation at high temperatures and vacuum with nanometer precision. This makes them the perfect choice for reliable filter control under extreme conditions.