Measuring the Deformation of a Magnetically Levitated Plate
Deformations in lightweight moving structures such as the wafer stages in semiconductor lithography systems hinder the fabrication process with a high throughput rate. To compensate these deformations, accurate measurements are required. C. H. H. M. Custers and I. Proimadis at the Eindhoven University of Technology (NL) designed a prototype based on attocube’s interferometer IDS3010 to study these properties in more detail. A grid of 5 x 5 M12/F40 sensor heads detects the deformation of the mover inside a bearingless planar motor with nm accuracy. By accurately detecting the induced deformation, the goal of the experiment was the active attenuation of the deformation by properly shaping the force distribution on the magnetically levitated translator.
This measurement was realized with the Displacement Measuring Interferometer.
