Rotation Compensation

Rotation Compensation

true nanometer accuracy in rotation

true nanometer accuracy in positioning

highest stability of rotation axis: runout < 100 nm (1 σ standard deviation) 

miniaturized design for confined spaces

small footprint, controller integrated compensation algorithm, no sensor integration into setup

highest angular accuracy

µ° resolution and m° repeatability

low vibration and high robustness

no air compression required due to piezo drive technology


* technology developed and patented by SOLEIL, industrialized by attocube


The Challenge

Positioning applications like three-dimensional X-ray imaging require nanoprecise rotation of beam optics and samples. Piezo-based rotation stages achieve high angular accuracy, but face one challenge: so-called “runout errors” in the micrometer range.

Runout errors occur due to radial movements during the rotation of the stage. This movement determines the achievable accuracy and resolution in nanoscale rotation applications.  


Analyze the problem

The displacement interferometer IDS3010 characterizes the movement of the rotation stages in two axes (x,y) with nanometer precision.  

Measurements prove that runout errors occur periodically. It is therefore possible to assign a device-specific correction factor to every angular position.  

The solution - active error compensation


As the radial-runout is predictable, it is possible to compensate errors. This is achieved by placing the rotator on a piezostage which allows nanometer precise XY-motions. Storing the device-specific correction factors into the controller of the xy-stage allows an automated compensation.

This leads to a significant increase of the stability of the rotation axis and therefore to real nanometer accuracy in positioning.