true nanometer accuracy in rotation
true nanometer accuracy in positioning
highest stability of rotation axis: runout < 100 nm (1 σ standard deviation)
miniaturized design for confined spaces
small footprint, controller integrated compensation algorithm, no sensor integration into setup
highest angular accuracy
µ° resolution and m° repeatability
low vibration and high robustness
no air compression required due to piezo drive technology
* technology developed and patented by SOLEIL, industrialized by attocube
Positioning applications like three-dimensional X-ray imaging require nanoprecise rotation of beam optics and samples. Piezo-based rotation stages achieve high angular accuracy, but face one challenge: so-called “runout errors” in the micrometer range.
Runout errors occur due to radial movements during the rotation of the stage. This movement determines the achievable accuracy and resolution in nanoscale rotation applications.
Analyze the problem
The displacement interferometer IDS3010 characterizes the movement of the rotation stages in two axes (x,y) with nanometer precision.
Measurements prove that runout errors occur periodically. It is therefore possible to assign a device-specific correction factor to every angular position.
The solution - active error compensation
As the radial-runout is predictable, it is possible to compensate errors. This is achieved by placing the rotator on a piezostage which allows nanometer precise XY-motions. Storing the device-specific correction factors into the controller of the xy-stage allows an automated compensation.
This leads to a significant increase of the stability of the rotation axis and therefore to real nanometer accuracy in positioning.